Intel completes acceptance testing of the EXE:5200B, the first production-grade High-NA scanner, for 14A

ASML/High-NA EUV (EXE)

Intel and ASML completed acceptance testing of the TWINSCAN EXE:5200B, the second-generation High-NA EUV scanner, which achieved 175 wafers per hour throughput with 0.7nm overlay accuracy. ASML CEO Christophe Fouquet said the tool would be tuned with customers through 2026, with High-NA mass production expected in 2027 to 2028.

• EXE:5200B is ASML's second-generation High-NA EUV scanner for mass production.
• Throughput of 175 wafers per hour with 0.7nm overlay accuracy.
• Higher-power EUV light source enables faster exposure; new wafer storage improves consistency.
• Mass production is targeted for 2027 to 2028 after full customer tuning through 2026.