ASML ships its first High-NA EUV system to Intel

ASML/High-NA EUV (EXE)

ASML shipped its first High-NA EUV system, the TWINSCAN EXE:5000, to Intel after a decade of development. The initial modules arrived at Intel's development fab in Oregon in late December 2023, representing the first-ever High-NA deployment.

• ASML Twinscan EXE:5000 first High-NA EUV system shipped to Intel after 10 years development; first modules delivered to Oregon fab December 2023.
• High-NA raises numerical aperture from 0.33 to 0.55, enabling features approximately 1.7 times smaller in single exposure versus 0.33 NA EUV.
• Machine capable of 200+ wafers per hour; technology expected inserted into post-18A nodes starting 2025.