The brief

Analyst view

• Canon applies its expertise in optics and precision manufacturing to semiconductor lithography.
• In 2023, Canon introduced FPA-1200NZ2C nanoimprint lithography for sub-5nm patterning.

Technical approach

As reported

Nanoimprint

Stamping instead of projecting

A hard mold presses directly into resist, avoiding diffraction limits of light projection.

Materials

Works on diverse substrates

Process works on silicon, glass, polymers for displays, optics and biodevices.

Cost

Lower equipment costs than EUV

Simpler systems than EUV. Molds reused many times, spreading costs over large production.