Canon announces FPA-1200NZ2C nanoimprint lithography system

Canon/FPA-1200NZ2C

Canon announced FPA-1200NZ2C for sub-5nm-class patterning using nanoimprint lithography. The system stamps patterns using a hard mold instead of optical projection. It offers lower costs than EUV but slower throughput.

• Nanoimprint stamps hard molds into resist, avoiding optical diffraction limits.
• Sub-5nm-class feature capability for advanced semiconductors.
• Simpler, lower-cost equipment than EUV tools.
• Works on silicon, glass, polymers for broader applications.
• Mold creation bottleneck: requires expensive EUV or e-beam lithography.