Keep TEL's near-monopoly on the resist steps around EUV scanners as chipmakers move to finer EUV and High-NA patterns, while cutting the defects that limit chip yield.
In volume use on EUV lines; TEL expects coater/developer sales to grow more than 50% in FY3/2027.
Updated 8 Jul 2024Checked 11 Oct0 updates this week
A drop of light-sensitive resist is spun across the wafer into a film tens of nanometres thick, then baked to set it.
The track is docked to the scanner. Robots pass each wafer in for exposure and back out, so timing between steps stays tight.
A post-exposure bake finishes the chemistry; a developer liquid then dissolves the exposed (or unexposed) resist, leaving the pattern.
TEL's Acrevia then fires a tilted beam of gas clusters at line sidewalls to trim widths and smooth rough edges from EUV printing.
| Spec | CLEAN TRACK LITHIUS Pro Z |
|---|---|
| Global coater/developer share | 91% (2025)R (reported) |
| EUV coater/developer share | ~100% (2021)E (estimated) |
| Wafer size | 300 mmR (reported) |
| Designed for | 10 nm node and beyond, EUVR (reported) |
R reported by the company · E our estimate
Tokyo Electron
Coater/developers, etch, deposition, cleaning
Tokyo Electron (TEL) is a Japanese chipmaking-equipment maker. Its tracks coat wafers with light-sensitive resist and develop them after exposure in lithography scanners, and it also sells etch, deposition, cleaning and wafer-test tools.
