KLA introduces eSL10 e-beam inspector to catch defects optical tools miss

KLA/Broadband Plasma wafer inspection (39xx)

KLA launched the eSL10, an electron-beam wafer inspector built around one high-current beam and deep-learning software. It is meant to work alongside KLA's 39xx and 29xx broadband optical inspectors on advanced logic, DRAM and 3D NAND chips, including finFET and gate-all-around transistors.

• Collects about 10 billion pixels of information per scan.
• Captures surface, topography, material and deep-trench signals at once.
• Several units were already running at leading logic and memory chipmakers and equipment makers at launch.