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ASML ships its 100th EUV system

ASMLLow-NA EUV (NXE)

ASML shipped its 100th extreme-ultraviolet lithography scanner, marking a major milestone 19 years after its 2001 commitment and 14 years after 2006 demo tools. EUV reached high-volume manufacturing in 2019; High-NA, the next generation, was already in development.

  • 100th EUV system shipped December 2020, spanning 19 years from commitment to production milestone
  • High-volume manufacturing adoption began in 2019 after nearly two decades of development
  • Next-generation High-NA EUV already in development for continued process node scaling
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