StoryFunding
xLight raises $40M Series B to accelerate free-electron laser development
xLightFree-Electron Laser EUV Source
xLight closed an oversubscribed $40M Series B funding round to advance its free-electron laser (FEL) technology for EUV lithography. The capital will accelerate development of compact FEL systems as alternatives to ASML's tin-plasma EUV sources.
- $40M Series B funding secured
- Capital to advance FEL prototype design and engineering
- Positioning xLight as a competitor to ASML's EUV light-source monopoly