US Department of Commerce signs letter of intent for $150M CHIPS Act funding to xLight

xLight/Free-Electron Laser EUV Source

The US Department of Commerce announced a non-binding letter of intent to provide up to $150M in federal incentives to xLight for developing a free-electron laser alternative to ASML's EUV lithography systems. The prototype will be built at the Albany Nanotech Complex in New York.

• Non-binding letter of intent for $150M federal incentives signed
• Funding to support FEL prototype construction and demonstration
• Commerce Department takes equity stake in the startup
• First demonstration targeted for 2028