StoryManufacturing
Intel receives the first High-NA EUV scanner from ASML
ASML delivered the first major components of its High-NA EUV lithography machine to Intel's Oregon fab. The system, reported to cost about $275M, will help Intel regain process leadership with production of the 18A node planned for 2025.
- First High-NA EUV machine delivered after CEO Pat Gelsinger secured rights to first shipments
- Intel expects to receive six machines by end of 2024
- Initial use targets 18A process node to compete on advanced chip manufacturing