Enable next-generation etch for advanced logic and memory nodes.
Announced Feb 2025; production tools deployed to leading chip makers by mid-2026.
Checked 11 Oct0 updates this week
Solid-state electronics generate plasma 100 times faster than traditional RF sources, reducing defects from patterning and improving control.
Pulsing the plasma enhances selectivity—the ratio of desired etch to unwanted material—and manages microloading across the wafer.
Ion energy is controlled to the atomic scale, enabling etch profiles where every nanometer matters for GAA and advanced DRAM geometries.
| Spec | Akara |
|---|---|
| Plasma source response speed | 100x faster than previous generationR (reported) |
| Primary applications | GAA transistors, 6F2 DRAM, 3D NANDR (reported) |
R reported by the company
Lam Research
Plasma etch, ALD deposition, Akara, ALTUS Halo
Lam Research designs semiconductor manufacturing equipment for etch and ALD. Akara is their latest conductor etch tool; ALTUS Halo is the first production molybdenum ALD tool.
