StoryHardware
Lam Research introduces Akara, the industry's most advanced conductor etch tool, and ALTUS Halo, the first molybdenum ALD tool in production
Lam Research announced Akara conductor etch tool and ALTUS Halo molybdenum ALD tool. Akara features DirectDrive plasma source (100x faster response), TEMPO plasma pulsing, and SNAP ion control, targeting GAA transistors and advanced DRAM. ALTUS Halo enables barrierless molybdenum metallization, cutting resistance by 50% versus tungsten stacks. Both tools are now deployed in production at leading fabs.
- Akara builds on 20 years of Lam etch leadership, with previous Kiyo tool having over 30,000 production chambers since 2004.
- ALTUS Halo reduces interconnect resistance by 50% and is already adopted by leading 3D NAND customers.
- Both tools address the critical etch and metallization bottlenecks for next-generation logic and memory at advanced nodes.